Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

To help designers find complex features with a design implementation, physical verification and DFM tools may employ pattern matching techniques. That is, a designer can simply copy a particular ...

As design nodes drop below 45nm, design rules are exploding in number and complexity, making design rule checking (DRC) harder and lengthier. What we have observed across the industry is that the ...

As the complexity of IC designs continues to grow, moving critical checks earlier in the design cycle helps designers identify and resolve issues before they escalate, streamlining the overall ...

This file type includes high resolution graphics and schematics. IC physical verification (i.e., design rule checking or “DRC”) used to be easy. In the good old days, you could run some ...

Several patterns come together in this living space designed by Morgan Farrow of Morgan Farrow Interiors. The scale of the patterns and the strategic use of color makes the space feel polished. Nathan ...

For many homeowners, pairing patterns is scary because it can turn into a design nightmare in seconds. Here's how designers ...