The semiconductor industry, constrained by the protracted delay in the introduction of next-generation lithography, has had to extend optical lithography below the 100-nanometer node by adopting ...
SAN FRANCISCO — KLA-Tencor Corp. has formally introduced a full-chip process window inspection system for post-RET (resolution enhancement technology) reticle design layout inspection. The system, ...
May 22, 2014. KLA-Tencor has announced the Teron SL650, a new reticle quality-control solution for IC fabs that supports 20-nm design nodes and beyond. With 193-nm illumination and multiple STARlight ...
Milpitas, CA. KLA-Tencor has announced the new FlashScan reticle blank (composite substrates onto which the reticle pattern is written) inspection product line. While KLA-Tencor has been a major ...
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